MD study on temperature dependence of sputtering yield

Temperature dependence of sputtering yield is studied through molecular dynamics (MD) simulation that is performed for Ag sputtered by 12.6 keV Ar impacting at normal incidence. The target temperature is considered from 300 to 1235 K. It is found that the target temperature has little effect on the monomer yield because it comes from the energetic collision cascade. On the other hand, the sputtered cluster yield increases with the target temperature. It seems that the sputtered cluster is produced due to the thermal spike near the surface and the thermal spike is strongly influenced by the target temperature.