Effects of the density of collision cascades: Separating contributions from dynamic annealing and energy spikes

We present a quantitative model for the efficiency of the molecular effect in damage buildup in semiconductors. Our model takes into account only one mechanism of the dependence of damage buildup efficiency on the density of collision cascades: nonlinear energy spikes. In our three-dimensional analysis, the volume of each individual collision cascade is divided into small cubic cells, and the number of cells that have an average density of displacements above some threshold value is calculated. We assume that such cells experience a catastrophic crystalline-to-amorphous phase transition, while defects in the cells with lower displacement densities have perfect annihilation. For the two limiting cases of heavy (500 keV/atom ²⁰⁹Bi) and light (40 keV/atom ¹⁴N) ion bombardment of Si, theory predictions are in good agreement with experimental data for a threshold displacement density of 4.5 at.%. For intermediate density cascades produced by small 2.1 keV/amu PF_n clusters, we show that dynamic annealing processes entirely dominate cascade density effects for PF₂ ions, while energy spikes begin contributing in the case of PF₄ cluster bombardment.