| FeSi熔体中SiC晶须的VLS生长 |
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| 引用本文： | 翟蕊,杨光义,吴仁兵,陈建军,林晶,吴玲玲,潘颐.FeSi熔体中SiC晶须的VLS生长[J].复合材料学报,2007,24(5):97-102. |
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| 作者姓名： | 翟蕊 杨光义 吴仁兵 陈建军 林晶 吴玲玲 潘颐 |
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| 作者单位： | 1.浙江大学 材料科学与工程系, 杭州 310027; |
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| 基金项目： | 教育部高等学校博士学科点专项科研基金（20030335057） 国家自然科学基金（50472059） |
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| 摘 要： | 在1500℃、 1600℃、 1650℃和1750℃氩气中保温3h, 使Fe-Si在石墨基板上熔化并敷展, 分别在熔层表面获得SiC颗粒层、 SiC颗粒与晶须混合层、 SiC晶须层和SiC腾空薄膜。XRD分析确定所有产物均为3C-SiC; TEM和SAED分析表明, SiC晶须为3C-SiC单晶, 生长方向为111]。基于上述结果, 提出不同温度下C与熔体中的Si经不同反应路径, 生成不同形貌SiC的反应机理: 低温时(≤1500℃), Fe提高了熔体中C的饱和溶解度, 以液-固(LS)反应生成SiC颗粒; 较高温度时(1500~1750℃), 借助Fe的催化作用, 以气-液-固(VLS)机理生成SiC晶须; 更高温度时(≥1750℃), 气-液-固(VLS)变得无序, 生成SiC腾空连续膜。
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| 关 键 词： | SiC晶须 液相法 VLS生长机理 |
| 文章编号： | 1000-3850（2007）05-0097-06 |
| 收稿时间： | 2006-10-30 |
| 修稿时间： | 2006-10-302007-01-24 |
VLS growth of SiC whisker from FeSi flux |
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| ZHAI Rui,YANG Guangyi,WU Renbing,CHEN Jianjun,LIN Jing,WU Lingling,PAN Yi.VLS growth of SiC whisker from FeSi flux[J].Acta Materiae Compositae Sinica,2007,24(5):97-102. |
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| Authors: | ZHAI Rui YANG Guangyi WU Renbing CHEN Jianjun LIN Jing WU Lingling PAN Yi |
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| Affiliation: | 1.Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China;2.Center of Materials Engineering, Zhejiang University of Science and Technology, Hangzhou 310018, China |
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| Abstract: | By melting Fe-Si flux on a graphite template at 1500℃, 1600℃, 1650℃ and 1750℃ for 3 hours in Ar atmosphere, SiC grains, SiC grain and whisker complex, SiC whiskers and SiC aerial films were obtained, respectively, over the solidified flux. The XRD proves that all of them are 3C-SiC. The TEM and SAED further confirm that the SiC whiskers belong to single crystalline 3C-SiC, and the growth direction is 111]. Based on these results, the growth mechanisms for the SiC with different morphologies are proposed. At the low temperature (≤1500℃), Fe enhanced the carbon solubility in the melt, and Si reacted with saturated C by the liquid-solid (LS) mode to produce SiC grains. In the higher temperature range (1500~1750℃), the SiC whiskers were grown by the vapor-liquid- solid (VLS) mode and Fe acted as the catalyst. At the temperature of 1750℃, the SiC aerial film was formed due to also the VLS mode but in a less ordered way. |
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| Keywords: | silicon carbide whiskers liquid phase techniques VLS mechanism |
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