| 化学气相沉积制备MoSi2涂层分析 |
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| 引用本文： | 史波,李贺军,李克智,付前刚. 化学气相沉积制备MoSi2涂层分析[J]. 材料导报, 2005, 19(7): 37-40 |
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| 作者姓名： | 史波 李贺军 李克智 付前刚 |
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| 作者单位： | 西北工业大学超高温复合材料国防重点实验室,西安,710072 |
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| 基金项目： | 国家自然科学基金，航空基础科学基金 |
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| 摘 要： | 主要介绍了目前化学气相沉积(CVD)制备MoSi2涂层或薄膜的几种方法,从反应原理和沉积产物结构等方面分析了各种方法的特点,提出了这些方法在制备MoSi2涂层过程中所存在的问题,并讨论了CVD制备MoSi2涂层应用于碳/碳复合材料高温抗氧化保护的可行性.
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| 关 键 词： | 化学气相沉积(CVD) 涂层 碳/碳复合材料 |
Analysis on the CVD Processes for MoSi2 Coatings |
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| SHI Bo,Li Hejun,LI Kezhi,FU Qiangang. Analysis on the CVD Processes for MoSi2 Coatings[J]. Materials Review, 2005, 19(7): 37-40 |
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| Authors: | SHI Bo Li Hejun LI Kezhi FU Qiangang |
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| Abstract: | Several methods of depositing moSi_2 coatings or thin films by chemical vapor deposition are re- viewed in this article.By introducing the reaction mechanisms and the microstructures of the deposited coatings or thin films,the characteristics of these methods and the current problems are summarized.At the same time.the feasibility of depositing MoSi_2 coatings by CVD serviced on the high temperature protection for carbon/carbon composites is ana- lyzed. |
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| Keywords: | MoSi2 |
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