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Anti-reflective coating for deep UV lithography process enhancement |
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| Authors: | Gregg A. Barnes Tony D. Flaim Susan K. Jones Bruce W. Dudley David A. Koester Charles R. Peters Stephen M. Bobbio |
| Abstract: | We describe here performance enhancements provided by an anti-reflective coating (ARC), developed for deep UV applications. The reduction in substrate reflections provided by the ARC layer results in significant increases in resolution capability and process latitude compared to single layer deep UV resist. Increased linewidth control and patterning capability for highly reflective, grainy, and topographical substrates is demonstrated. |
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