| 电光调制技术在光刻对准中的应用 |
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| 引用本文： | 梁友生,曹益平,周金梅,邢廷文.电光调制技术在光刻对准中的应用[J].微细加工技术,2005(1):22-25,42. |
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| 作者姓名： | 梁友生 曹益平 周金梅 邢廷文 |
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| 作者单位： | 1. 四川大学光电科学技术系,成都,610064
2. 中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都,610209 |
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| 基金项目： | 微细加工光学技术国家重点实验室基金资助项目(KFS4) |
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| 摘 要： | 介绍了投影光刻机离轴对准系统的结构和相位探测的原理，详细讨论了电光相位调制技术抑制杂散光的机理，并分析比较了有无杂散光对光刻对准精度的影响。结果表明，使用电光调制技术可有效提高投影光刻的对准精度。
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| 关 键 词： | 光刻 对准 对准精度 电光调制技术 杂散光抑制 |
| 文章编号： | 1003-8213(2005)01-0022-04 |
Application of Electro-optical Modulation Technique in Lithography Alignment |
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| LIANG You-sheng,CAO Yi-ping,ZHOU Jin-mei,XING Ting-wen.Application of Electro-optical Modulation Technique in Lithography Alignment[J].Microfabrication Technology,2005(1):22-25,42. |
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| Authors: | LIANG You-sheng CAO Yi-ping ZHOU Jin-mei XING Ting-wen |
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| Affiliation: | LIANG You-sheng~1,CAO Yi-ping~1,ZHOU Jin-mei~2,XING Ting-wen~2 |
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| Abstract: | The construction and phase detection theory of off-axis alignment system in projection photolithography are introduced in detail. The method of restraining the stray light using (electro-)optical phase modulator is proposed extensively. The alignment accuracies are analyzed and compared when the stray light exists or not. Results show that the alignment accuracy is obviously improved by the (electro-)optical modulation. Thus, electro-optical modulation is one of the effective technologies to improve the alignment accuracy in projection photolithography. |
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| Keywords: | lithography alignment alignment accuracy electro-optical modulation stray light restraining |
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