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| 通用工艺与设备 | |
| 摘 要： | Y2002-63234-325 0302841低 K 电介质的电子束处理及设备=Advanced EB-cureprocess and equipment for low-K dielectric会,英]/On-ishi,T.& Nagaseki,K.//2001 IEEE InternationalSymposium on Semiconductor Manufacturing.—325～328(E)Y2002-63239-163 0302842多晶硅表面微加工 MEMS 结构制备=Fabrication ofpolysilicon surface micromachined MEMS structures会,英]/Munger,K.& Fuller,L.F.//2001 IEEE Uni-versity/Government/Industry Microelectronics Sympo-sium.—163～166(E) |
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