隔壁塔中新型气相分配器的多相流模拟及控制机制

在隔壁塔中加入了以科恩达效应为基础的新型气相分配器并以此建模利用Fluent进行多相流模拟。结果显示在加入液相的情况下，新型气相分配器依然遵循科恩达效应。即气相从分配器的细缝喷出带走其周围气相，在分配器下方形成负压，以此实现调控Rv的目的。类比气相分配器的工作原理，在预分馏塔的塔板之间选择一位置引出一定量气相，此相当于分配器喷出的气相。在主塔段输入相同量的气相，此相当于分配器入口处气相。通过改变输入或输出的气速来调节Rv。模拟结果显示，在温度或浓度控制结构的基础上加入此控制机制可以更好地实现气相分配的效果。

Multiphase Flow Simulation of New Vapor Distributor in Dividing Wall Column and Control Mechanism

A new vapor distributor based on the Coanda effect is added to the Dividing Wall column（DWC）, and the multiphase flow simulation is performed using ANSYS Fluent by this model. The results show that with the addition of the liquid phase, the new vapor distributor still follows the Coanda effect. Hereby, the vapor is ejected from the slits of the distributor to take away the surrounding vapor, and a negative pressure is formed under the distributor, so as to achieve the purpose of regulating Rv. Analogously to the working principle of vapor distributor, a certain amount of vapor is drawn out from a position of prefractionator, which is equivalent to the vapor ejected by the distributor. The same amount of vapor is fed into the main column, which corresponds to the gas phase at the inlet of the distributor. The Rv is adjusted by changing the speed of the input or output vapor. Simulation results show that adding this control mechanism on the basis of temperature or concentration control structure can better achieve the effect of vapor distribution.