Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography |
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Authors: | Mi-Hee Jung Hyoyoung Lee |
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Affiliation: | (1) Thin Film Solar Cell Technology Research Team, Advanced Solar Technology Research Department, Convergence Components & Materials Research Laboratory, Electronics and Telecommunications Research Institute, Daejeon, Republic of Korea;(2) National Creative Research Initiative, Center for Smart Molecular Memory, Department of Chemistry, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, 440-746, Republic of Korea |
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Abstract: | In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon
substrate. To fabricate nano-patterned ZnO nanorods, patterning of an n-octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) on SiO2 substrate was prepared by the polymer mask using NI. The ZnO seed layer was selectively coated only on the hydrophilic SiO2 surface, not on the hydrophobic OTS SAMs surface. The substrate patterned with the ZnO seed layer was treated with the oxygen
plasma to oxidize the silicon surface. It was found that the nucleation and initial growth of the crystalline ZnO were proceeded
only on the ZnO seed layer, not on the silicon oxide surface. ZnO photoluminescence spectra showed that ZnO nanorods grown
from the seed layer treated with plasma showed lower intensity than those untreated with plasma at 378 nm, but higher intensity
at 605 nm. It is indicated that the seed layer treated with plasma produced ZnO nanorods that had a more oxygen vacancy than
those grown from seed layer untreated with plasma. Since the oxygen vacancies on ZnO nanorods serve as strong binding sites
for absorption of various organic and inorganic molecules. Consequently, a nano-patterning of the crystalline ZnO nanorods
grown from the seed layer treated with plasma may give the versatile applications for the electronics devices. |
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