| 纳米压印技术的最新进展 |
| |
| 引用本文： | 王金合,费立诚,宋志棠,张静,周为民,张剑平. 纳米压印技术的最新进展[J]. 微纳电子技术, 2010, 47(12). DOI: 10.3969/j.issn.1671-4776.2010.12.001 |
| |
| 作者姓名： | 王金合 费立诚 宋志棠 张静 周为民 张剑平 |
| |
| 作者单位： | 上海市纳米科技与产业发展促进中心纳米加工技术实验室;中国科学院上海微系统与信息技术研究所纳米技术研究室; |
| |
| 摘 要： | 总结了纳米压印技术的最新进展,其中包括压印工艺、图形赋形方法以及纳米压印技术应用三方面最新的研究成果。在压印工艺的发展方面,大面积滚轴压印的发明最具有产业化意义,它不仅解决了常规平板压印很难大面积压印成型的困难,而且整个过程是一种柔性压印过程,降低了成本,提高了压印效率,但是最小特征尺寸还有待提高;在图形赋形方法的改进中,聚合物探针阵列技术集微米和纳米成型技术于一身,压印效率高,应用前景广阔;在压印技术应用的发展中,光伏电池、电子存储设备以及传感器等为纳米压印技术的应用提供了新的领域。
|
| 关 键 词： | 纳米压印技术 大面积滚轴压印 聚合物探针阵列 光伏电池 交叉电极阵列 |
Latest Progress in Nano-Imprint Lithography |
| |
| Wang Jinhe,Fei Licheng,Song Zhitang,Zhang Jing,Zhou Weimin,Zhang Jianping. Latest Progress in Nano-Imprint Lithography[J]. Micronanoelectronic Technology, 2010, 47(12). DOI: 10.3969/j.issn.1671-4776.2010.12.001 |
| |
| Authors: | Wang Jinhe Fei Licheng Song Zhitang Zhang Jing Zhou Weimin Zhang Jianping |
| |
| Affiliation: | Wang Jinhe1,2,Fei Licheng1,Song Zhitang2,Zhang Jing1,Zhou Weimin1,Zhang Jianping1(1.Laboratory of Nano-Technology,Shanghai Nanotechnology Promotion Center,Shanghai 200237,China,2.Laboratory of Nano-Technology,Shanghai Institute of Microsystem and Information Technology,China Academy of Sciences,Shanghai 200050,China) |
| |
| Abstract: | The latest progresses in nano-imprint lithography are introduced briefly,including the imprint process,patterning techniques and applications of nano-imprint lithography.The large area roll-to-roll and roll-to-plate nanoimprint lithography is the most exciting invention for imprinting progress due to its low cost and high efficiency,and shows good practical application performances.It solves the problem that traditional nano-imprint can not imprint in a large area,the whole process is flexible printing,but ... |
| |
| Keywords: | nano-imprint lithography large area roll-to-roll nanoimprint lithography polymer probe array photovoltaic cell cross-electrode array |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
