Adhesion property of SiOx-doped Diamond-like Carbon Films Deposited on Polycarbonate by Inductively Coupled Plasma Chemical Vapor Deposition |
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| Authors: | Sang-min Baek Tatsuru ShirafujiNagahiro Saito Osamu Takai |
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| Affiliation: | a Department of Materials, Physics and Energy Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japanb EcoTopia Science Research Institute, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japanc Deptartment of Physical Electronics and Informatics, Osaka City University, 3-3-138 Sugimoto-cho, Sumiyoshi-ku, Osaka, 558-8585, Japan |
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| Abstract: | SiOx-DLC (diamond-like coating) films as candidates for protection coating of polymers were prepared by using a pulse-biased inductively coupled plasma chemical vapor deposition system with acetylene, tetramethylsilane and oxygen gasses. Effects of the gas composition and O2 plasma pre-treatment on adhesion of the SiOx-DLC films were investigated. Adhesion strength of Si-DLC films (with 0% oxygen) was almost the same to that of undoped DLC films. By employing O2-plasma pre-treatment, adhesion strength of the Si-DLC films was considerably improved, while that of the undoped DLC films was not. The SiOx-DLC films with the carbon to oxygen (O/C) ratio of 0.15 showed adhesion strength as high as that of the Si-DLC films on the O2-plasma pre-treated substrate. However, further improvement of adhesion strength of the SiOx-DLC was not realized by employing the O2-plasma pre-treatment. On the other hand, the SiOx-DLC films showed favorable feature of high deposition rate and large optical band gap although higher O/C ratio (> 0.15) brought about poor adhesion strength of the films. |
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| Keywords: | Adhesion Diamond-like carbon (DLC) Polycarbonate (PC) Inductively coupled plasma chemical vapor deposition (ICP-CVD) |
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