三维复杂微系统的微立体光刻成型工艺

介绍了一种具有更高加工分辨率且可直接成型 3维复杂微系统的一次曝光型微立体光刻成型样机 Micro SL er,及其配套专用光敏树脂 Micro SL5 2 2 0。重点给出了 Micro SL er中经薄膜晶体管阵列编址的液晶显示光阀表盘 ,也即可控透光模板的构造、性能及其对 Micro SL er层面加工分辨率和截面曝光尺寸的影响。对比了 Micro SL er的国产配套光敏树脂 Mi-cro SL5 2 2 0与国外同类产品 DSM7110型光敏树脂的各项技术指标。为证明一次曝光型微立体光刻工艺在成型 3维复杂微结构时的优越性 ,给出了经 Micro SL er成型出的微机械部件、微型件浇铸模、微流体系统部件等实物的扫描电子显微照片及相关的加工参数。探讨了现阶段的传统立体光刻工艺、小光斑立体光刻工艺及微立体光刻工艺在加工分辨率方面的差异 ,分别指出了影响这 3种立体光刻成型分辨率的关键因素

Micro Stereo Lithography process for Fabricating Complex Three-dimensional Micro System

MicroSLer, a integral micro stereo lithography prototype with better resolution and being able to manufacture small and complex three-dimensional objects directly, is presented. Micro SL5220, a special kind of photoconductive resin for MicroSLer, is also presented. It stresses on the construction, performance of the thin film transistor addressed liquid crystal display light valves panel, viz. dynamic pattern generator of MicorSLer, and its impact upon the lateral resolution and exposure dimension of section of MicroSLer. Each performance index of homemade photoconductive resin Micro SL5220 is compared with that of foreign photoconductive resin DSM7110. To prove the advantage of the integral micro stereo lithography process in manufacturing small and complex three-dimensional objects, several scanning electron microscope photos of micro mechanical parts, micro moulds and micro fluid system components manufactured by MicroSLer and the correlative process parameters are given. The differences in resolutions of conventional, small spot and micro stereo lithography technologies are discussed, and the pivotal factors affecting the resolutions of these three stereo lithography technologies are indicated.