| Abstract: | The room temperature gamma irradiation degradation of the lithographic polymers, poly(methylmethacrylate) (PMMA), poly(methyl-α-chloroacrylate) (PMCA), poly(methyl-α-fluoroacrylate) (PMFA), and poly(methylacrylonitrile) (PMCN), have been studied by electron spin resonance and electron nuclear double resonance (ENDOR) to assess their molecular degradation processes of relevance to electron beam lithography. Two classes of radicals are found, chain radicals and chain scission radicals. PMMA and PMCA mainly form chain scission radicals consistent with degradation while for PMCN the resolution is poorer, and this is only probable. PMFA forms mainly chain radicals consistent with predominant crosslinking. The total radical yield is greatest in PMCA and PMCN. ENDOR is used to assess the compactness of the radiation degradation region for PMMA and PMCA and hence the potential resolution of the resist; this appears to be about the same for these methacrylate polymers. |
