Surface oxidation of nickel metal as studied by X-Ray photoelectron spectroscopy |
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Authors: | Geoffrey C. Allen Philip M. Tucker Robert K. Wild |
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Affiliation: | (1) Berkeley Nuclear Laboratories, Central Electricity Generating Board, GL13 9PB Berkeley, Gloucestershire, England |
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Abstract: | X-ray photoelectron spectroscopy has been used to study the oxidation of polycrystalline nickel metal. The results indicate that the oxidation process takes place in three stages; associative adsorption of molecular oxygen, followed by the combination of oxygen atoms with surface nickel atoms and, ultimately, the formation of bulk oxide. At room temperature only the first two stages can be detected. For exposures below 1 L the O 1s photoelectron spectrum is considered to be characteristic of an associatively adsorbed oxygen species, but for exposures above this value evidence for the formation of a monolayer of NiO is suggested by the development of an O 1s peak at 529.9 eV. Incorporation of oxygen into the nickel lattice is observed at temperatures >500°K. The activation energy for this place-exchange process was estimated at 1.80±0.06 eV. |
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Keywords: | nickel oxidation surface reactions X-ray photoelectron spectroscopy |
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