Transport properties and defects in semi-insulating and Si-implanted InP |
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Authors: | Jin K Rhee Pallab K Bhattacharya |
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Affiliation: | (1) Department of Electrical & Computer Engineering, Oregon State University, 97331 Corvallis, Oregon |
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Abstract: | The transport properties and defect levels in Si-implanted semi-insulating and liquid phase epitaxial InP have been studied
by Hall and photoconductivity measurements. Wide variations in the conductivity and Hall coefficient have been measured in
semi-insulating InP:Fe and the results have been analyzed and interpreted by appropriate charge neutrality models. The energy
position of the Fe and Cr acceptor levels have been determined to be 0.68 and 0.40 eV, respectively, below the conduction
band minimum. The implantation studies indicate that the electrical properties of the layers are very sensitive to implant
dose and energy, the type and thickness of encapsulant and the anneal temperature. High-resistivity or p-type conductivity
was observed in layers implanted with 6.0 × 1011 to 4.0 × 1012 cm−2 Si+. In general, better results were obtained with sputtered Si3N4 encapsulation. Varying amounts of Fe and Cr outdiffused to the active layer during annealing and a dominant defect, 0.56
eV below the conduction band, was observed in the photoconductivity spectra. |
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Keywords: | ion-implantation transport properties semi-insulating InP liquid phase epitaxy |
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