Simulation of a microprofile and electric field distribution in MIM structures

Simulation of etching of a microtip’s lower electrode and deposition of a dielectric film has shown that the film undergoes a strong thinning at lateral surfaces and at the microtip’s bases. It is demonstrated that, at a microtip density of 5 × 10⁸ cm⁻², the electric field’s strength at the base of the tip is 3.5 times that at its apex, which gives rise to additional emission centers.