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Effect of acetic acid on electrochemical deposition of carbon-nitride thin film |
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| Authors: | Yu Tian JianZhong Wang WeiFeng Yu RongGen Cao Yun Song XiJing Ning |
| Affiliation: | (1) Institute of Modern Physics, Fudan University, Shanghai, 200433, China;(2) Applied Ion Beam Physics Laboratory, Key Laboratory of the Ministry of Education, Fudan University, Shanghai, 200433, China;(3) Electronic Materials Laboratory, Department of Materials Science, Fudan University, Shanghai, 200433, China |
| Abstract: | Electrochemical deposition method was employed to prepare CN x thin film from methanol-urea solution, and it was shown that adding a little acetic acid in the solution significantly affected the deposition process. After optimizing the experiment conditions, we obtained polycrystalline grains with sizes of about 3–7 μm on the faces of single crystal silicon. X-ray diffraction spectrua indicate that the grains are mainly composed of cubic phase mixed with a small amount of β and α phases. Supported by the National Natural Science Foundation of China (Grant No. 10574030) |
| Keywords: | carbon nitride electrochemical deposition CN x films deposition mechanism |
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