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掺Pt的SnO2薄膜气敏特性研究
引用本文:白振华,潘国峰,孙以材,张效玮. 掺Pt的SnO2薄膜气敏特性研究[J]. 传感器世界, 2008, 14(3): 14-18
作者姓名:白振华  潘国峰  孙以材  张效玮
作者单位:河北工业大学微电子研究所,300130;河北工业大学信息工程学院
摘    要:用直流磁控溅射法分别在si(111)基片及陶瓷基片上制备掺有Pt的Sn02薄膜,并进行500℃~700℃退火处理,对掺杂前后的薄膜进行XRD分析,测试各掺杂样品气敏特性。500℃退火后,掺杂样品对各种有机气体有较高的灵敏度,随着溅射时间的延长,气敏特性提高。700℃退火后,45min溅射的样品对氨气有很高的灵敏度和很好的选择性,最佳工作温度为220℃左右。随着掺杂时间延长,气敏特性降低。

关 键 词:SnO2薄膜  磁控溅射  气敏特性  灵敏度
文章编号:1006-883(2008)03-0014-05

Investigation on Gas Sensing Properties of SnO2 Thin Films Doped With Pt
Abstract:Thin films SnO2 doped with Pt were prepared by DC magnetron sputtering on Si (lll) wafers and ceramic tubes. Afterwards, annealing was carded out respectively at 500℃ and 700℃. The structure was studied by XRD and the sensing properties were tested , the samples showed higher sensitivitytowards the organic vapor after 500℃ annealing. After 700℃ annealing, the samples with 45 minutes Pt-doping showed excellent selectivity and high sensitivity only towards ammonia vapor . The best operating temperature is 220℃. The sensing properties decreased with the doping time beyond 45 minutes.
Keywords:Sn02 thin films  doped sputter  sensing properties  sensitivity
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