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激光晶化制备多晶硅薄膜技术
引用本文:袁志军,楼祺洪,周军,董景星,魏运荣,王之江.激光晶化制备多晶硅薄膜技术[J].激光与光电子学进展,2007,44(11):52-57.
作者姓名:袁志军  楼祺洪  周军  董景星  魏运荣  王之江
作者单位:中国科学院上海光学精密研究所,上海,201800
摘    要:激光晶化是一种制作晶硅薄膜器件(如薄膜晶体管、太阳能电池)很有效的技术.展望了低温多晶硅薄膜的应用前景,详细介绍了近几年激光晶化制备多晶硅薄膜技术的研究成果,并就激光对非晶硅作用的原理作了简单讨论.

关 键 词:薄膜  低温多晶硅  激光晶化  玻璃衬底  激光晶化  多晶硅薄膜  薄膜技术  Silicon  Thin  Film  Polycrystalline  原理  作用  非晶硅  激光对  研究  前景  应用  低温  太阳能电池  薄膜晶体管  薄膜器件  制作
收稿时间:2007/5/31
修稿时间:2007-05-31

Laser-Induced Crystallization of Polycrystalline Silicon Thin Film
YUAN Zhijun,LOU Qihong,ZHOU Jun,DONG Jingxing,WEI Yunrong,WANG Zhijiang.Laser-Induced Crystallization of Polycrystalline Silicon Thin Film[J].Laser & Optoelectronics Progress,2007,44(11):52-57.
Authors:YUAN Zhijun  LOU Qihong  ZHOU Jun  DONG Jingxing  WEI Yunrong  WANG Zhijiang
Affiliation:Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800
Abstract:Laser crystallization is an effective technique for obtaining high-performance polycrystallie Si thinfilm devices, such as TFTs and solar cells. The future development of low-temperature polycrystalline silicon thin film is prospected. Mean-while, the latest progress about the laserinduced crystallization of amorphous silicon thin film is introduced in detail. The working principles of laser and amorphous silicon are reviewed briefly.
Keywords:thin film  low  temperature polycrystalline silicon  laser-induced crystallization  glass substrate
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