| 改进缺陷,套刻和聚焦性能的第五世代浸没式曝光系统 |
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| 作者姓名： | Jan Mulkens Bob Streefkerk Hans Jasper Jos de Klerk Fred de Jong Leon Levasier Martijn Leenders |
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| 作者单位： | ASML Netherlands B.V.De Run 6501, 5504 DR Veldhoven,The Netherlands |
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| 摘 要： | 论述了第五世代双扫描平台浸液式扫描曝光机的性能和进展。表明了在高速扫描状态下有生产价值的套刻和聚焦性能的实现。浸液式设备更多的关键部分与缺陷有关,而且该机的改进是通过有生产价值的缺陷水平方面来体现的。为了保持这种缺陷水平的改进效果,需要在圆片应用中进行专门稳定的测量。特加是边缘空泡除去(EBR)设计和圆片斜面良流线性是很重要的。
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| 关 键 词： | 浸液式扫描曝光机 套刻和聚焦性能 缺陷改进 污染粒子控制 |
| 文章编号： | 1004-4507（2008）03-0013-07 |
| 收稿时间： | 2008-02-01 |
| 修稿时间： | 2008年2月1日 |
Defects,Overlay and Focus Performance Improvements with Five Generations of Immersion Exposure Systems |
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| Jan Mulkens Bob Streefkerk Hans Jasper Jos de Klerk Fred de Jong Leon Levasier Martijn Leenders.Defects,Overlay and Focus Performance Improvements with Five Generations of Immersion Exposure Systems[J].Equipment for Electronic Products Marufacturing,2008,37(3):13-19. |
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| Authors: | Jan Mulkens Bob Streefkerk Hans Jasper Jos de Klerk Fred de Jong Leon Levasier Martijn Leenders |
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| Abstract: | This paper discusses the current performance and the evolution of five generations TWINSCAN immersion scanning exposure tools. It is shown that production worthy overlay and focus performance can be achieved at high scan speeds. The more critical part for immersion tools is related to defects, but also here improvements resulted in production worthy defect levels. In order to keep the defect level stable special measures are needed in the application of wafers. Especially Edge Bead Removal(EBR) design and wafer bevel cleanliness are important. |
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| Keywords: | Immersion scanning exposure tools Overlay and focus performance Defects improvements Particle contamination controlling |
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