Copolymer electron resists: poly(stryene-methyl methacrylate) copolymers |
| |
| Authors: | Varinder K Sharma Stanley Affrossman Richard A Pethrick |
| |
| Affiliation: | Department of Pure and Applied Chemistry, University of Strathclyde, Thomas Graham Building, 295 Cathedral Street, Glasgow G1 1XL, UK |
| |
| Abstract: | The factors influencing electron beam sensitivity are reviewed. The variation of electron beam sensitivity and constrast are reported for a series of random copolymers of styrene and methyl methacrylate. Data are also presented for an alternating copolymer of styrene and methyl methacrylate. This study indicates the effects which arise when a negative resist material, polystyrene, is incorporated into a positive resist material, poly(methyl methacrylate). |
| |
| Keywords: | Poly(methyl methacrylate) polystyrene copolymers resists alternating copolymer electron beam |
| 本文献已被 ScienceDirect 等数据库收录！ |
