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Luminescence thermal quenching of M_2SiO_4:Eu~(2+)(M=Sr,Ba) phosphors
Affiliation:1. Department of Environmental and Life Sciences, Toyohashi University of Technology, Toyohashi 441-8580, Japan;2. Department of Materials Science and Engineering, Nagoya Institute of Technology, Nagoya 466-8555, Japan;3. Research Fellow of Japan Society for the Promotion of Science, Japan;1. Institute of Chemistry and Materials Engineering, Changzhou Vocational Institute of Engineering, Changzhou 213164, China;2. College of Chemistry, Chemical Engineering and Materials Science, Soochow University, Suzhou 215123, China;1. College of Materials and Chemistry, China Jiliang University, Hangzhou, 310018, China;2. Institute of Optoelectronic Materials and Devices, China Jiliang University, Hangzhou, 310018, China;3. Hangzhou Vocational and Technical College, Hangzhou, 310018, China;1. Department of Chemistry, Faculty of science AISECT University, Bhopal, India;2. Department of Physics, R. T. M. Nagpur University, Nagpur 440033, India;3. P.G. Department of Physics & Electronics, DAV College, Amritsar 143001, Punjab, India
Abstract:In this paper, luminescence thermal quenching of M2SiO4:Eu2+ (M = Sr, Ba) orthosilicate phosphors and mechanisms for thermal quenching proposed by different authors are briefly reviewed. Depending on preparation conditions and/or Eu2+-doping concentrations, the quenching temperature (T1/2) and activation energy for thermal quenching of the same orthosilicate phosphor reported by different authors are inconsistent. The common conclusion is that T1/2 of the intermediate compound (Ba1?xSrx)2SiO4:Eu2+ (x ≈ 0.5) is higher than that of either Sr2SiO4:Eu2+ or Ba2SiO4:Eu2+ end-member. Moreover, T1/2 of the best-performing SrBaSiO4:Eu2+ is evidently lower than that of YAG:Ce3+ and some Eu2+-doped nitride phosphors. Regarding the quenching mechanism, most of the investigators attributed thermal quenching to a thermally assisted 4f–5d cross-over in the configuration coordinate diagram. Only a few authors ascribed thermal quenching to a thermally assisted photoionization of 5d electron to conduction band of the host. Nonetheless, a close inspection of T1/2 and Stokes shift derived from the vibrational spectra of the intermediate compound and end-member phosphors indicates that the 5d electron photoionization model instead of the 4f–5d crossing decay model should be the genuine mechanism for the thermal quenching of M2SiO4:Eu2+ (M = Sr, Ba) phosphors. Since the relationship between T1/2 and Stokes shift of the phosphors does not support the 4f–5d crossing decay model. The ionization probability of the 5d electron depends on the energy gap (EdC) between 5d1 level of the Eu2+ and conduction band minimum (CBM) of the host at higher temperatures. Lattice thermal expansion would result in an elevating 5d1 level of the Eu2+ along with a diminishing CBM of the host and as a consequence a reduction in EdC and an enhanced photoionization probability at elevated temperatures. A less rigid lattice and hence a larger coefficient of thermal expansion of M2SiO4 hosts should be the physical origin of poorer thermal quenching properties of the orthosilicate phosphors.
Keywords:Thermal quenching  Photoionization  Rare earths
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