|
|||||
|
|
Characteristics of SiH4/H2 VHF plasma produced by short gap discharge |
|
| Authors: | Tatsuyuki Nishimiya Tsukasa Yamane Sachiko Nakao Yoshiaki Takeuchi Yasuhiro Yamauchi Hiromu Takatsuka Hiroshi Muta Kiichiro Uchino Yoshinobu Kawai |
| Affiliation: | 1. Nagasaki Research & Development Center, Mitsubishi Heavy Industries Ltd., Fukahori, Nagasaki, 851-0392, Japan;2. Solar Cell Power System Business Unit, Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854-0065, Japan;3. Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan |
| Abstract: | A SiH4/H2 VHF plasma was produced with the multi rod electrode and the fundamental plasma parameters were examined as a function of pressure and power, where the frequency of the power source was 60 MHz. It was found that the ion saturation current takes a peak at a certain power as well as pressure. These results were discussed from the point of view of electron trapping effect in VHF electric fields. In addition, anomalous reduction of the sheath potential was observed. |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ | |