Application of a novel microwave plasma treatment for the sintering of nickel oxide coatings for use in dye-sensitized solar cells

In this study the use of microwave plasma sintering of nickel oxide (NiO_x) particles for use as p-type photoelectrode coatings in dye-sensitized solar cells (DSSCs) is investigated. NiO_x was chosen as the photocathode for this application due to its stability, wide band gap and p-type nature. For high light conversion efficiency DSSCs require a mesoporous structure exhibiting a high surface area. This can be achieved by sintering particles of NiO_x onto a conductive substrate. In this study the use of both 2.45 GHz microwave plasma and conventional furnace sintering were compared for the sintering of the NiO_x particles. Coatings 1 to 2.5 μm thick were obtained from the sintered particles (mean particle size of 50 nm) on 3 mm thick fluorine-doped tin oxide (FTO) coated glass substrates. Both the furnace and microwave plasma sintering treatments were carried out at ~ 450 °C over a 5 min period. Dye sensitization was carried out using Erythrosin B and the UV–vis absorption spectra of the NiO_x coatings were compared. A 44% increase in the level of dye adsorption was obtained for the microwave plasma sintered samples as compared to that obtained through furnace treatments. While the photovoltaic performance of the DSSC fabricated using the microwave plasma treated NiO_x coatings exhibited a tenfold increase in the conversion efficiency in comparison to the furnace treated samples. This enhanced performance was associated with the difference in the mesoporous structure of the sintered NiO_x coatings.