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CuW/CrCu自力型整体触头界面还原及结合强度
引用本文:范志康,梁淑华,肖鹏.CuW/CrCu自力型整体触头界面还原及结合强度[J].电工材料,2003(4):13-17.
作者姓名:范志康  梁淑华  肖鹏
作者单位:西安理工大学材料科学与工程学院,西安,710048
摘    要:自力型CuW/CrCu整体弧触头的立式熔接工艺是指在立式气氛可控烧结炉内对CuW触头部分与尾部CrCu熔结的过程,是制造整体触头的关键技术。CuW/CrCu整体弧触头的立式熔接首先要对CuW合金的界面进行还原处理,以清除在熔接前由于种种原因界面上出现的氧化夹杂等,确保界面的良好结合,尾部CrCu的cr含量是影响CuW/CrCu界面结合强度的另一重要因素,适当的Cr含量是必须的。

关 键 词:CuW  CrCu  自力型整体触头  立式熔接工艺  界面  还原  结合强度
修稿时间:2003年8月30日

The Interface Reduction and Bonding Strength of CuW/CrCu Self-Elastic Solid Contact
FAN Zhi-kang,LIANG Shu-hua,XIAO Peng.The Interface Reduction and Bonding Strength of CuW/CrCu Self-Elastic Solid Contact[J].Electrical Engineering Materials,2003(4):13-17.
Authors:FAN Zhi-kang  LIANG Shu-hua  XIAO Peng
Abstract:The vertical bonding process by malting in the key process for manufacturing solid contacts. The contact of CuW was bonded with the tail of CrCu by malting in a vertical atmosphere-controllable sintering furnace. The interface of CuW alloy should be treated firstly by reduction during the bonding process, in order remove the oxides impurities existed on the interface and get a good interface bonding. The Cr content of the CrCu tail is another important factor affecting the bonding strength between CuW/CrCu interface. It is necessary to have a suitable Cr content.
Keywords:CuW/CrCu  interface  reduction  bonding strength
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