Ion beam-induced positive imaging of polyimide via two step imidization

The preparation of ion track membranes of thermally stable polyimide films has been performed by ion beam irradiation of partially imidized polyamic acid (PAA) films followed by alkaline etching and final imidization. No discernible positive hole patterns were observed on the irradiated films of partially imidized PAA containing sulfonyl linkages, although sulfonyl group is known to be highly sensitive to ion beams. In contrast, positive hole patterns appeared on the irradiated films of the partially imidized PAA with 68-89% imidization degrees that contains sulfonyl linkages along with a methylene group in the main chain. The most contrasty hole patterns with 0.3 μm diameter were observed on the irradiated PAA films of 89% imidization degree. The irradiated PAA film with the hole patterns was then transformed to the corresponding polyimide film with curing at 350 °C for 1 h. From the structural comparison of the polyimides, the possible mechanism for the hole pattern formation is suggested.