Pattern formation in polymer films under the mask |
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Authors: | Juan PengYanchun Han Yuming YangBinyao Li |
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Affiliation: | State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China |
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Abstract: | This paper presents a straightforward method for patterning thin films of polymers, i.e. a prepatterned mask is used to induce self-assembly of polymers and the resulting pattern is the same as the lateral structures in the mask on a submicrometre length scale. The patterns can be formed at above Tg+30 °C in a short time and the external electric field is not crucial. Electrostatic force is assumed to be the driving force for the pattern transfer. Viscous fingering and novel stress-relief lateral morphology induced under the featureless mask are also observed and the formation mechanisms are discussed. |
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Keywords: | Patterning Polymer film Electrostatic instability |
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