The Structure of the Irreversibly Bound Adhesion Promoter-Substrate Interfacial Layer of γ-Aminopropylsilanetriol on Crystalline Si, as Measured by XPS and FTIR |
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Authors: | A. Domingue K. Piyakis E. Sacher M. Di Renzo S. D nomm e T. H. Ellis |
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Affiliation: | A. Domingue ,K. Piyakis,E. Sacher,M. Di Renzo,S. Dé,nommé,e,T. H. Ellis |
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Abstract: | The irreversibly bound interfacial layer deposited by the γ-aminopropysilanetriol adhesion promoter onto a crystalline silicon substrate, which remains even after profuse washing, was found by XPS to have resulted from the fragmentation and rearrangement of the original γ-aminopropylsilanetriol molecule. A mechanism is proposed, involving the homolytic scission of the terminal N-C bond. One of the subsequent reactions is believed to involve hydrogen loss by abstraction and the formation of a terminal vinyl group, which bonds to the substrate. Support for this mechanism is found in IR spectroscopy of this layer. |
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Keywords: | amine-terminated silane ester adhesion promoter irreversibly bound surface layer surface analysis infrared spectroscopy homolytic bond scission fragmentation and rearrangement |
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