Nano-slit probes for near-field optical microscopy fabricated by focused ion beams |
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Authors: | H U Danzebrink TH Dziomba T Sulzbach O Ohlsson C Lehrer & L Frey |
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Affiliation: | Physikalisch-Technische Bundesanstalt, Bundesallee 100, D-38116 Braunschweig, Germany,;Nanosensors Dr Olaf Wolter GmbH, Im Amtmann 6, D-35578 Wetzlar, Germany,;Fraunhofer Institut für Integrierte Schaltungen —Bauelementetechnologie, Schottkystr. 10, D-91058 Erlangen, Germany |
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Abstract: | The near-field probes described in this paper are based on metallized non-contact atomic force microscope cantilevers made of silicon. For application in high-resolution near-field optical/infrared microscopy, we use aperture probes with the aperture being fabricated by focused ion beams. This technique allows us to create apertures of sub-wavelength dimensions with different geometries. In this paper we present the use of slit-shaped apertures which show a polarization-dependent transmission efficiency and a lateral resolution of < 100 nm at a wavelength of 1064 nm. As a test sample to characterize the near-field probes we investigated gold/palladium structures, deposited on an ultrathin chromium sublayer on a silicon wafer, in constant-height mode. |
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Keywords: | Atomic force microscopy focused ion beam technique infrared microscopy nano-slit near-field probes scanning near-field optical microscopy |
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