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Hierarchical Self‐Assembly of Block Copolymers for Lithography‐Free Nanopatterning |
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| Authors: | Bong Hoon Kim Dong Ok Shin Seong‐Jun Jeong Chong Min Koo Sang Chul Jeon Wook Jung Hwang Sumi Lee Moon Gyu Lee Sang Ouk Kim |
| Affiliation: | 1. Department of Materials Science and Engineering KAIST Institute for the Nanocentury Korea Advanced Institute of Science and Technology (KAIST) Daejeon 305‐701 (Korea);2. Hybrid Materials Research Center Korea Institute of Science and Technology (KIST) Cheongryang Seoul P.O. BOX 131 (Korea);3. National Nanofab Center (NNFC) 373‐1 Guseong‐dong Yuseong‐gu Daejeon 305‐701 (Korea);4. Samsung Advanced Institute of Technology (SAIT) Mt. 14‐1 Nongseo‐dong Giheung‐gu Yongin‐si Gyunggi‐do 446‐712 (Korea) |
| Abstract: | |
| Keywords: | Block copolymers Hierarchical structures Micropatterning Nanopatterning Self‐organization |