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Nanopatterned Self‐Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer‐Scale Adsorption and Etch Masks |
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| Authors: | Sivashankar Krishnamoorthy Raphael Pugin Juergen Brugger Harry Heinzelmann Christian Hinderling |
| Affiliation: | 1. Nanotechnology & Life Sciences section Swiss Center for Electronics and Microtechnology SA (CSEM SA) Neuchatel 2000 (Switzerland);2. Microsystems Laboratory (LMIS) Ecole Polytechnique Federale de Lausanne Ecublens 1015 (Switzerland) |
| Abstract: | |
| Keywords: | block copolymers lithography micelles surface patterning self‐assembled monolayers |