Influence of thermal annealing on optical properties and surface morphology of NiOx thin films |
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| Affiliation: | 1. Al Isra University, Faculty of Information Technology, Department of Basic Sciences-Physics, Amman 16197, Jordan;2. University of Jordan, Faculty of Science, Physics Department, Amman 1192, Jordan;1. Laboratoire Géoressouces, Matériaux, Environnement et Changements Globaux, Faculté des Sciences de Sfax, Université de Sfax, 3018 Sfax, Tunisia;2. Laboratoire de chimie industrielle, Ecole Nationale d''ingénieurs de Sfax, Université de Sfax, 3018 Sfax, Tunisia;3. Laboratoire des Matériaux et du Génie Physique, 3 Parvis Louis Néel, BP 257, 38016 Grenoble, France;4. CNR Istituto processi chimico-fisici, Viale f. Stagno d''Alcontres 37, 98158 Messina, Italy |
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| Abstract: | NiOx thin films were deposited by reactive DC-magnetron sputtering from a nickel metal target in Ar + O2 with the relative O2 content of 5%. Thermal annealing effects on optical properties and surface morphology of NiOx films were investigated by X-ray photoelectron spectroscopy, thermogravimetric analysis, scanning electron microscope and optical measurement. The results showed that the changes in optical properties and surface morphology depended on the temperature. The surface morphology of the films changed obviously as the annealing temperature increased due to the reaction NiOx → NiO + O2 releasing O2. The surface morphology change was responsible for the variation of the optical properties of the films. The optical contrast between the as-deposited films and 400 °C annealed films was about 52%. In addition, the relationship of the optical energy band gap with the variation of annealing temperature was studied. |
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