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基于面内补偿的微机电系统离面运动测试
引用本文:陈澄,李艳宁,陈治,Dante Dorantes,胡小唐. 基于面内补偿的微机电系统离面运动测试[J]. 光电子.激光, 2012, 0(2): 310-314
作者姓名:陈澄  李艳宁  陈治  Dante Dorantes  胡小唐
作者单位:天津大学精密测试技术及仪器国家重点实验室;天津大学精密测试技术及仪器国家重点实验室;天津大学精密测试技术及仪器国家重点实验室;天津大学精密测试技术及仪器国家重点实验室;天津大学精密测试技术及仪器国家重点实验室
基金项目:天津市科技计划(11JCYBJC06300);科技部国际科技合作与交流专项(2008DFA71610);国家自然科学基金重点项(60723004),国家自然科学基金面上项目(50675152)资助项目
摘    要:将频闪成像技术和相移显微干涉技术相结合,提出了一种基于面内补偿的微机电系统(MEMS)离面运动测试方法。首先通过相移显微干涉技术自动采集MEMS结构运动周期内不同准静态位置处的数帧相移干涉图像;然后通过图像处理得到每个准静态位置的亮场图像,进行面内位移测试;最后利用面内位移测试结果对离面位移测试进行补偿,即双相位展开算法,完成对于MEMS结构的离面运动测试。实验结果表明:面内运动的测试的精度可达0.01 pixel,静态离面高度测试的重复精度可达0.52 nm,可以完成伴随着面内位移的MEMS离面位移测试。

关 键 词:微机电系统(MEMS)  频闪成像  相移显微干涉  双相位展开

Out-of-plane motion measurement of MEMS based on compensation of in-plane motion
CHEN Cheng,LI Yan-ning,CHEN Zhi,Dante Dorantes and HU Xiao-tang. Out-of-plane motion measurement of MEMS based on compensation of in-plane motion[J]. Journal of Optoelectronics·laser, 2012, 0(2): 310-314
Authors:CHEN Cheng  LI Yan-ning  CHEN Zhi  Dante Dorantes  HU Xiao-tang
Affiliation:State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,Tianjin 300072,China;State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,Tianjin 300072,China;State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,Tianjin 300072,China;State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,Tianjin 300072,China;State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,Tianjin 300072,China
Abstract:Combining stroboscopic imaging and phase-stepping microscopic interferometry,a micro-electromechanical system(MEMS) out-of-plane measuring method based on compensation of in-plane motion is established.First,it can automatically acquire interferograms at different quasi-static positions in moving periods of MEMS structures with phase-stepping microscopic interferometry technology.Then,bright-field images at different quasi-static positions can be gained from interferograms by image processing to measure in-plane motions of MEMS structures.Finally,out-of-plane motions of MEMS structures can be compensated by inplane tests results,called as double-phase unwrapping,to complete measurements of MEMS out-of-plane motions.Experimental results indicate that the measuring resolution of in-plane tests is u to 0.01 pixel,and the measuring repetition of static out-of-plane tests is 0.52 nm.It can satisfy the measuring requirements of MEMS out-of-plane motion along with in-plane motion.
Keywords:micro-electromechnical system(MEMS)  stroboscopic imaging  phase-stepping microscopic interferometry  double-phase unwrapping
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