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ZnO薄膜气相法制备
引用本文:鲁俊雀,王秀峰,伍媛婷,许雅琴.ZnO薄膜气相法制备[J].材料导报,2011,25(19):64-67.
作者姓名:鲁俊雀  王秀峰  伍媛婷  许雅琴
作者单位:陕西科技大学材料科学与工程学院,西安,710021
基金项目:陕西省自然科学基金(2009JM6008;2010JQ6006);陕西省教育厅科研计划项目(2009JK362)
摘    要:ZnO薄膜具有压电、光电、压敏、气敏、发光等多种特性,应用十分广泛。介绍了ZnO薄膜气相法制备原理中的各类主要方法,包括脉冲激光沉积、磁控溅射、分子束外延、金属有机化合物化学气相沉积、单源化学气相沉积和等离子体增强化学气相沉积等技术;分析了这些方法的优缺点;展望了ZnO薄膜今后的研究方向。

关 键 词:氧化锌薄膜  ZnO薄膜  气相法

Preparation of ZnO Thin Films by Thermal Vapor Condensation
LU Junque,WANG Xiufeng,WU Yuanting,XU Yaqin.Preparation of ZnO Thin Films by Thermal Vapor Condensation[J].Materials Review,2011,25(19):64-67.
Authors:LU Junque  WANG Xiufeng  WU Yuanting  XU Yaqin
Affiliation:(School of Materials Science and Engineering,Shaanxi University of Science & Technology,Xi’an 710021)
Abstract:ZnO thin films have many characteristics such as piezoelectricity,photoelectricity voltage-sensitive,gas-sensitive,luminescence,etc.Therefore,it can be used in various fields.This article introduces some important methods of ZnO thin films which were prepared by thermal vapor condensation,such as pulsed laser deposition,magnetron sputtering,molecular beam epitaxy,metal-organic chemical vapor deposition,single-source chemical vapor deposition and plasma enhanced chemical vapor deposition,etc.The advantages and disadvantages of these methods are analyzed.Finally,the research direction of ZnO thin films in the future is prospected.
Keywords:zinc oxide thin films  ZnO thin films  thermal vapor condensation
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