Control of coercive force of Co-Cr sputtered films

The role of c-axis orientation of the crystallites in the sputtered Co-Cr thin films has been investigated aiming for the control of the coercive force of the film. It has been confirmed that the c-axis orientation plays a very important role to control the coercive force, Hcperpand Hcparellel. When the c-axis of the film is well oriented, only Hcperpchanges with the increase of the substrate temperature Ts leaving Hcparellelrather constant. However, both Hcperpand Hcparellelchange together with the increase of Ts when the film is poorly oriented. It has been considered that Ts is only the factor adjustable for controlling Hc of the films, but the results in this study indicate that the c-axis orientation is the another factor to control Hcperpand Hcparellel, separately.