Design, fabrication and analysis of micromachined high sensitivity and 0% cross-axis sensitivity capacitive accelerometers

This paper presents the design and fabrication of three MEMS based capacitive accelerometers. The first design illustrates the achievement of an accelerometer with 0% cross-axis sensitivity and has been fabricated using PolyMUMPs, a multi-user surface-micromachining process. A unidirectional parallel plate configuration is utilized in this design to illustrate the achievement of 0% cross-axis sensitivity and an acceptable performance range. In addition, a method is introduced to improve the sensitivity of a capacitive sensor employing a transverse configuration based on the relationship of initial gaps setup in comb-finger arrangements. A design based on this technique and the PolyMUMPs fabrication process is illustrated which demonstrates a sensitivity value of 4.07 fF/μm, with a nonlinearity of 2.05% for a ±3 μm sensor operating range. The last design based on this method and the SOIMUMPs fabrication process exhibits a sensitivity of 3.45 pF/μm for ±1 μm operating range of the sensor.