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掩膜成像法在LiNbO_3:Fe晶体制作缺陷态光子晶格
引用本文:张宝光,杨立森,陈宝东,崔俊杰,付存宝,何冬梅. 掩膜成像法在LiNbO_3:Fe晶体制作缺陷态光子晶格[J]. 信息记录材料, 2008, 9(5)
作者姓名:张宝光  杨立森  陈宝东  崔俊杰  付存宝  何冬梅
作者单位:内蒙古师范大学,物理与电子信息学院,呼和浩特,010022
基金项目:内蒙古师范大学研究生科研创新基金,国家自然科学基金 
摘    要:在用掩膜法制作光子晶格的实验中,我们分别在薄、厚LiNbO3:Fe晶体中成功地制作了带有缺陷的(2+1)维光折变光子晶格且比较了二者的异同,并结合透镜成像的相关理论找出了造成这些异同的因素,又对这些因素做了详细的分析。这对更好的利用掩膜成像法制作光折变光子晶格有一定的指导意义。

关 键 词:掩膜成像法  LiNbO3:Fe晶体  缺陷  光子晶格  分立度

Fabricating Defective Photonic Lattices in LiNbO3 : Fe Crystal By Mask-Imaging Method
ZHANG Bao-guang,YANG Li-sen,CHEN Bao-dong,CUI Jun-jie,FU Cun-bao,HE Dong-mei. Fabricating Defective Photonic Lattices in LiNbO3 : Fe Crystal By Mask-Imaging Method[J]. Information Recording Materials, 2008, 9(5)
Authors:ZHANG Bao-guang  YANG Li-sen  CHEN Bao-dong  CUI Jun-jie  FU Cun-bao  HE Dong-mei
Abstract:In the experiment of the production of photonic lattice which by Mask-Imaging Method, we have successfully produced a defective (2+1)-dimensional photorefractive photonic lattice in thin and thick LiNbO3:Fe Crystal respectively, and done some comparison of the two case. combined with the theory of lens imaging we have found some factors which caused the differences between the two case, and do detailed analysis toward these factors.it is quite important to use the Mask-Imaging Method to produce photorefractive photonic lattice more efficiently in the future.
Keywords:mask-imaging method  LiNbO3:Fe crystal  defect  photorefractive photonic lattice  independent degree
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