UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing |
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| Authors: | Ran Ji Michael Hornung Marc A Verschuuren Robert van de Laar Jan van Eekelen Ulrich Plachetka Michael Moeller Christian Moormann |
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| Affiliation: | 1. Süss MicroTec Lithography GmbH, Garching 85748, Germany;2. Philips Research, Eindhoven 5656AE, The Netherlands;3. AMO GmbH, Aachen 52074, Germany;1. Department of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan;2. Tsukuba Research Center, Kuraray Co., Ltd., 41 Miyukigaoka, Tsukuba, Ibaraki 305-0841, Japan;1. National Institute for Materials Science, 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan;2. Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-7, Megro-ku, Tokyo 153-8904, Japan;1. Department of Materials Science and Engineering, Korea University, Anam-Dong 5-1, Sungbuk-Ku, Seoul 143-701, Republic of Korea;2. School of Mechanical Engineering, Yonsei University, Seoul 120-749, Republic of Korea;1. Institute of Nanostructure Technologies and Analytics (INA), University of Kassel, Heinrich-Plett-Str. 40, 34132 Kassel, Germany;2. Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), Heinrich-Plett-Str. 40, 34132 Kassel, Germany;3. NanoImprint Konsortium Hessen (NIH), Heinrich-Plett-Str. 40, 34132 Kassel, Germany;4. SUSS MicroTec AG, Schleissheimer Str. 90, 85748 Garching, Germany;1. Engineering Research Center for Optoelectronics of Guangdong Province, South China University of Technology, Guangzhou 510640, China;2. School of Physics and Optoelectronics, South China University of Technology, Guangzhou 510640, China;3. Academy of Electronics and Information, South China University of Technology, Guangzhou 510640, China |
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| Abstract: | The global LED (light emitting diode) market reached 5 billion dollors in 2008 and will be driven towards 9 billion dollors by 2011 1]. The current applications are dominated by portable device backlighting, e.g. cell phones, PDAs, GPS, laptop etc. In order to open the general lighting market doors the luminous efficiency needs to be improved significantly. Photonic crystal (PhC) structures in LEDs have been demonstrated to enhance light extraction efficiency on the wafer level by researchers 2]. However, there is still a great challenge to fabricate PhC structures on LED wafers cost-effectively. Nanoimprint lithography (NIL) 3] has attracted considerable attentions in this field due to its high resolution, high throughput and low cost of ownership (CoO). However, the current NIL techniques with rigid stamps rely strongly on the substrate flatness and the production atmosphere. Those factors hinder the integration of NIL into high volume production lines. UV-NIL with flexible stamps 4], e.g. PDMS stamps, allows the large-area imprint in a single step and is less-sensitive to the production atmosphere. However, the resolution is normally limited due to stamp distortion caused by imprint pressure.A novel NIL technique developed by Philips Research and Süss MicroTec, substrate conformal imprint lithography (SCIL), bridges the gap between UV-NIL with rigid stamp for best resolution and soft stamp for large-area patterning. Based on a cost-effective upgrade on Süss mask aligner, the capability can be enhanced to nanoimprint with resolution of down to sub-10 nm on an up to 6 inch area without affecting the established conventional optical lithographic processes on the machine. Benefit from the exposure unit on the mask aligners, the SCIL process is now extended with UV-curing option, which can help to improve the throughput dramatically. In this paper, the fabrication of photonic crystal structures with SCIL technique on Süss MA6 mask aligner is demonstrated. In addition, the industrialization considerations of UV-SCIL process in high volume manufacturing are briefly discussed. |
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