Photolithographic patterning of polymer-encapsulated optical oxygen sensors |
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| Authors: | Volker Nock Maan Alkaisi Richard J Blaikie |
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| Affiliation: | 1. Department of Materials Science and Engineering, Korea University, Seoul 136-713, South Korea;2. Department of Material Science & Engineering, Hanyang University, Seoul 133-791, South Korea;1. Marine Research Institute IIM-CSIC, Eduardo Cabello, 6, 36208 Vigo, Spain;2. Dept. of Chemical Engineering, School of Engineering, University of Santiago de Compostela, Campus Vida, 15782 Santiago de Compostela, Spain |
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| Abstract: | In this paper we show a novel fabrication process capable of yielding arbitrarily-shaped optical oxygen sensor patterns at micron resolution. The wafer-level process uses a thin-film sacrificial metal layer as intermediate mask, protecting the sensor material and enabling the use of conventional semiconductor patterning techniques. Feature sizes down to 3 μm are demonstrated and only limited by the lithographic process. Gaseous oxygen detection using the patterned sensors shows Stern–Volmer behaviour with a measured intensity ratio I100/I0 of 10.8, the highest reported for a lab-on-a-chip compatible glass substrate. The process has the potential to enable the integration of multiple sensor patches underneath single cells for laterally registered oxygen sensing in cell-culture applications. |
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