Evaluation of filling behavior on UV nanoimprint lithography using release coating |
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| Authors: | Kazutomo Osari Noriyuki Unno Jun Taniguchi Ken-ichi Machinaga Takeshi Ohsaki Nobuji Sakai |
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| Affiliation: | 1. Department of Applied Electronics, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan;2. Research Fellow of the Japan Society for the Promotion of Science, 6 Ichibancho, Chiyoda-ku, Tokyo 102-8471, Japan;3. Toyo Gosei Co., Ltd., Photosensitive Materials Research Center, 4-2-1 Wakahagi, Inba-mura, Inba-gun, Chiba 270-1609, Japan;1. Department of Materials and Ceramics Engineering, CICECO, University of Aveiro, Aveiro 3810-193, Portugal;2. Department of Mechanical Engineering, University of Coimbra, Portugal;1. National Institute for Materials Science, 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan;2. Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-7, Megro-ku, Tokyo 153-8904, Japan;1. Graduate School of Mechanical Engineering, Pusan National University, Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan 609-735, Republic of Korea;2. School of Mechanical Engineering and ERC/NSDM, Pusan National University, Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan 609-735, Republic of Korea;1. Department of Mechanical Engineering, BMS College of Engineering, Bengaluru 560 019, Karnataka, India;2. Department of Mechanical Engineering, Government Polytechnic, Bagepalli 561 207, Karnataka, India;3. Department of Civil Engineering, BMS College of Engineering, Bengaluru 560 019, Karnataka, India |
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| Abstract: | Ultra violet nanoimprint lithography (UV-NIL), which is able to obtain the nano-scale pattern effectively and quickly, is strongly desired for the next-generation lithography technology. However, it is well known that the higher viscosity UV-curable resin with UV-NIL tends to be the shorter obtained pattern without the sufficient transfer pressure. This phenomenon is caused by the filling behavior of UV-curable resin into the UV-NIL mold, thus, the investigation of the filling behavior is very important. In this study, the filling behavior in UV-NIL was observed by using a “midair structure mold”, which is able to eliminate the bubble defect. As a result, it is clear that the filling behavior with low transfer pressure was depended on the capillary force in the mold pattern, which is described by the mold aperture size, the mold surface condition and the resin property. |
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