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Soft X-ray spectroscopy of oxide-embedded and functionalized silicon nanocrystals |
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| Authors: | Joel A Kelly Eric J Henderson Colin M Hessel Ronald G Cavell Jonathan GC Veinot |
| Affiliation: | 1. Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada T6G 2G2;2. Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712, USA;1. University of Bologna, Italy;2. IHP Frankfurt (Oder), Germany;3. INSA-Lyon, France;4. CRISMAT-ENSICAEN and IUT-Caen-UCBN, Caen, France;5. PANalytical, Brighton, UK;6. NEST, CNR-INFM and Scuola Normale Superiore, Pisa, Italy |
| Abstract: | An X-ray absorption spectroscopic investigation into the electronic and optical properties of silicon nanocrystals (Si-NCs) derived from the thermal processing of hydrogen silsesquioxane (HSQ) is presented. Hydrofluoric (HF) acid etching and subsequent photochemical hydrosilylation with styrene liberates the as-synthesized oxide-embedded Si-NCs from their matrix and renders them solution dispersible through the formation of surface Si–C bonds. The impact of this process on the photoluminescence behavior exhibited by these materials has been studied through near edge X-ray absorption fine structure (NEXAFS) and X-ray excited optical luminescence (XEOL) spectroscopies. |
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