Stable superhydrophobic surfaces induced by dual-scale topography on SU-8 |
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| Authors: | Jose Marquez-Velasco Maria-Elena Vlachopoulou Angeliki Tserepi Evangelos Gogolides |
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| Affiliation: | 1. Department of Chemistry, University of Bari, via Orabona 4, 70126 Bari, Italy;2. Department of Civil, Environmental, Land, Building Engineering, and Chemistry, Polytechnic University of Bari, via Orabona 4, 70126 Bari, Italy;3. Department SIMAU, University Politecnica delle Marche, via Brecce Bianche 12, 60131 Ancona, Italy;4. Institute of Nanotechnology - CNR, via Orabona 4, 70126 Bari, Italy;1. College of Chemistry and Material Science, Fujian Normal University, Fuzhou 350007, PR China;2. Fujian Key Laboratory of Polymer Materials, Fuzhou 350007, PR China |
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| Abstract: | SU-8 is a photosensitive resist widely used for the fabrication of MEMS and lab-on-a-chip devices, as well as of model structures for testing wetting theories. In this work, superhydrophobic surfaces are fabricated on SU-8 by combining micro- and nano-sized structures formed by means of lithography and plasma etching, respectively. It is found that nanotexturing of the micropatterned SU-8 surfaces is essential in enhancing surface hydrophobicity and rendering the surfaces water repellent (i.e. minimizing contact angle hysteresis). The proposed method will be shown to be of paramount importance for the fabrication of mechanically stable and robust superhydrophobic SU-8 surfaces with low aspect ratio microstructuring. |
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