Fabrication of a 3D stamp with the micro- and nano-scale patterns through combined NIL and optical lithography processes |
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| Authors: | Sooyeon Park Geehong Kim Keebong Choi Jaejong Lee |
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| Affiliation: | 1. University of Science and Technology, Daejeon 305-333, Republic of Korea;2. Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea;1. University of Padova, Department of Physics and Astronomy, Via Marzolo 8, 35131 Padova, Italy;2. LaNN Laboratory for Nanofabrication of Nanodevices, Corso Stati Uniti 4, 35127 Padova, Italy;3. IOM-CNR, Area Science Park, Basovizza, Italy;4. University of Padova, Department of Pharmaceutical Sciences, Via Marzolo 5, 35131 Padova, Italy;5. Institute of Inorganic Chemistry and Surfaces (CNR-ICIS), Corso Stati Uniti 4, 35127 Padova, Italy;6. University of Padova, Department of Chemical Sciences, Via Marzolo 1, 35131 Padova, Italy;1. Department of Mechatronic Technology, National Taiwan Normal University, Taipei 106, Taiwan;2. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 10029, China;2. School of Chemistry, Bio21 Institute, University of Melbourne, Victoria, Australia;3. Department of Biochemistry and Molecular Biology, Monash University, Clayton, Victoria, Australia;1. Research Institute of Advanced Materials (RIAM), Department of Materials Science and Engineering, Seoul National University, 56-1, Shinlim-dong, Gwanak-gu, Seoul 151-744, Republic of Korea;2. Korean Intellectual Property Office, Room 905, 4-Dong, Government Complex–Daejeon, Daejeon 302-701, Republic of Korea;3. Nano-Mechanical Systems Research Center, Intelligent and Precision Machinery Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-gu, Daejeon 305-343, Republic of Korea;4. Department of Fiber System Engineering, Dankook University, 126 Jukjeon-dong, Suji-gu, Yongin-si, Gyeonggi-do 448-701, Republic of Korea |
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| Abstract: | Nanoimprint lithography is in the spotlight of the nano technology field for its ability to produce large area patterning 1], 2], 4]. This kind of lithography is also able to fabricate three-dimensional functional structures all at once. In order to fabricate three-dimensional structures for an entire wafer, simple fabrication of three-dimensional large area stamp that combines micro- and nano-scale patterns is required. This paper proposes, the fabrication process of three-dimensional large area stamp that incorporates both micro- and nano-scale pattern. The three-dimensional stamp, which accounts for areas that range from 70nm to 3um, is fabricated on a Si substrate using nanoimprint lithography and optical lithography. |
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