| 靶功率对射频磁控溅射制备MoS_2-Sb_2O_3复合薄膜结构和性能的影响 |
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| 引用本文： | 张延帅,周晖,万志华,桑瑞鹏,郑军. 靶功率对射频磁控溅射制备MoS_2-Sb_2O_3复合薄膜结构和性能的影响[J]. 润滑与密封, 2011, 36(7). DOI: 10.3969/j.issn.0254-0150.2011.07.017 |
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| 作者姓名： | 张延帅 周晖 万志华 桑瑞鹏 郑军 |
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| 作者单位： | 兰州物理研究所表面工程技术重点实验室 甘肃兰州730000 |
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| 摘 要： | 采用射频磁控溅射技术制备MoS2-Sb2O3复合薄膜,研究靶功率对薄膜性能和结构的影响。利用XRD、XRF分析薄膜的成分和结构,用CSM薄膜综合性能仪测试薄膜的硬度及附着力,通过承载力试验测试薄膜的承载性能,使用真空球-盘摩擦试验机测试真空和大气下薄膜的摩擦因数及耐磨寿命。结果表明:使用射频磁控溅射制备的MoS2-Sb2O3复合薄膜具有准非晶结构,其薄膜结构和成分受沉积时的靶功率影响;MoS2-Sb2O3复合薄膜在真空下具有比大气下更稳定的摩擦学性能,更长的耐磨寿命;提高溅射原子能量能有效地提高MoS2-Sb2O3复合薄膜的承载性能,减少薄膜的内应力,提高薄膜的附着力,提高薄膜的耐磨寿命。
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| 关 键 词： | 射频磁控溅射 MoS2-Sb2O3复合薄膜 靶功率 结构和性能 |
The Effect of Target Power on the Structure and Performance of RF Magnetron Sputtering Deposited MoS_2-Sb_2O_3 Thin Films |
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| Zhang Yanshuai,Zhou Hui,Wan Zhihua,Sang Ruipeng,Zheng Jun. The Effect of Target Power on the Structure and Performance of RF Magnetron Sputtering Deposited MoS_2-Sb_2O_3 Thin Films[J]. Lubrication Engineering, 2011, 36(7). DOI: 10.3969/j.issn.0254-0150.2011.07.017 |
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| Authors: | Zhang Yanshuai Zhou Hui Wan Zhihua Sang Ruipeng Zheng Jun |
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| Affiliation: | Zhang Yanshuai Zhou Hui Wan Zhihua Sang Ruipeng Zheng Jun(National Key Lab of Science and Technology on Surface Engineering,Lanzhou Institute of Physics,Lanzhou Gansu 730000,China) |
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| Abstract: | MoS2-Sb2O3 thin films were deposited by RF magnetron sputtering technology,the effect of target power on coating structure and performance was studied.Coating composition and crystal structure were analyzed using XRF and XRD,coating nanohardness and adhesion force to substrate were measured using CSM nano-tester,tribological properties in vacuum and atmosphere environment were evaluated by ball-on-disc friction and wear tester.The results show that the MoS2-Sb2O3 composite films prepared by RF magnetron spu... |
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| Keywords: | RF magnetron sputtering MoS2-Sb2O3 coating target power structure and performance |
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