| 双向脉冲电镀银对抗变色能力的影响 |
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| 引用本文： | 杨哲龙,安茂忠.双向脉冲电镀银对抗变色能力的影响[J].哈尔滨工业大学学报,1997,29(2):77-79. |
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| 作者姓名： | 杨哲龙 安茂忠 |
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| 摘 要： | 以银层抗变色特性为主要指标，对双向脉冲光亮镀银的工艺参数进行了优选，最佳脉冲参数为：频率８００Ｈｚ、正向占空比为１０％、负向占空比为零。在最佳参数下得到的银镀层光亮平滑，抗变色能力优良，与直流光亮镀银相比较，抗变色性能提高１０％以上。
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| 关 键 词： | 镀银 脉冲电镀 抗变色性 电镀 |
The Effect of Double Direction Pulse Parameterson Electrodeposition of Bright Silver |
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| Yang. Zhelong An Maozhong,Li Guogiang Zhang Jingshuang,Tu,Zhenmi Zhang Tongbin.The Effect of Double Direction Pulse Parameterson Electrodeposition of Bright Silver[J].Journal of Harbin Institute of Technology,1997,29(2):77-79. |
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| Authors: | Yang Zhelong An Maozhong Li Guogiang Zhang Jingshuang Tu Zhenmi Zhang Tongbin |
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| Affiliation: | Dept . of Applied. Chemistry |
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| Abstract: | The optimum pulse parameters of double direction pulse electrodeposition of bright sil- ver which are 800Hz pulse frequency, 1 0% positive duty cycle and 0 negative duty cycle were ob- tained by comparing the aati-tarish property of deposited silver. The anti-arish property of the smooth and bright deposit under optimum conditions is 10% over that of the deposit under dc conditions . |
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| Keywords: | Electrodeposition of bright silver: pulse plating: anti-tarish property |
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