Design and fabrication of a novel reflection filter |
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Authors: | Sun Xuezheng Gu Peifu Shen Weidong Liu Xu Wang Yuan Zhang Yueguang |
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Affiliation: | State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310027, China. surpassluo@163.com |
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Abstract: | Reflection filters are useful in optical communication, display, and other systems. A novel reflection filter is designed and fabricated. Analytical design formulas have been put forward and show good agreement with the measured maximum reflectance as well as with the bandwidth at the central wavelength. The effective admittance and distribution of the electrical field intensity are also calculated to analyze the properties of the filter. This novel filter with high peak reflectance, narrow bandwidth, and deep cutoff, is simple to design, easy to fabricate and convenient to integrate, compared with the conventional dielectric multilayer reflection filters. |
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