Nanoprofiles evaluation of ZnO thin films by an evanescent light method |
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| Authors: | Nina Mirchin Aaron Peled Liviu Duta Andrei C Popescu Gabriela Dorcioman Ion N Mihailescu |
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| Affiliation: | 1. EE Department, Holon Institute of Technology, , Holon, Israel, 58102;2. Lasers Department, National Institute for Lasers, Plasma and Radiation Physics, , RO‐77125 Bucharest‐Magurele, Romania |
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| Abstract: | The extraction efficiency of evanescent light from ZnO nanolayers and their thickness profiles in the range of (1–105) nm was evaluated by a new microscopy technique, differential evanescent light intensity imaging method. It is based on capturing the evanescent light scattered by the layer of the material deposited on glass substrates. The analyzed ZnO films were obtained by pulsed laser deposition at 27°C and 100°C, using a nanosecond UV laser source. Microsc. Res. Tech., 76:992–996, 2013. © 2013 Wiley Periodicals, Inc. |
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| Keywords: | evanescent wave imaging ZnO nanofilms pulsed laser deposition |
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