Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading |
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| Authors: | Jeong Ho Mun Seung Keun Cha Ye Chan Kim Taeyeong Yun Young Joo Choi Hyeong Min Jin Jae Eun Lee Hyun Uk Jeon So Youn Kim Sang Ouk Kim |
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| Affiliation: | 1. Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi‐Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, Republic of Korea;2. School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, Republic of Korea |
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| Abstract: | Spatial arrangement of 1D nanomaterials may offer enormous opportunities for advanced electronics and photonics. Moreover, morphological complexity and chemical diversity in the nanoscale components may lead to unique properties that are hardly anticipated in randomly distributed homogeneous nanostructures. Here, controlled chemical segmentation of metal nanowire arrays using block copolymer lithography and subsequent reversible metal ion loading are demonstrated. To impose chemical heterogeneity in the nanowires generated by block copolymer lithography, reversible ion loading method highly specific for one particular polymer block is introduced. Reversibility of the metal ion loading enables area‐selective localized replacement of metal ions in the self‐assembled patterns and creates segmented metal nanowire arrays with different metallic components. Further integration of this method with shear aligning process produces high aligned segmented metal nanowire array with desired local chemical compositions. |
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| Keywords: | block copolymers nanowires pattern transfer self‐assembly |
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