Templated Sub‐100‐nm‐Thick Double‐Gyroid Structure from Si‐Containing Block Copolymer Thin Films |
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| Authors: | Karim Aissou Muhammad Mumtaz Giuseppe Portale Cyril Brochon Eric Cloutet Guillaume Fleury Georges Hadziioannou |
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| Affiliation: | 1. Laboratoire de Chimie des Polymères Organiques, CNRS – ENSCPB – Université de Bordeaux, Pessac Cedex, France;2. Macromolecular Chemistry & New Polymeric Materials, Zernike Institute for Advanced Materials, AG, Groningen, The Netherlands |
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| Abstract: | The directed self‐assembly of diblock copolymer chains (poly(1,1‐dimethyl silacyclobutane)‐block‐polystyrene, PDMSB‐b‐PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double‐wave pattern formation is reported within the 3D‐nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent‐vapor annealing process results in very large grains (over 10 µm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub‐100‐nm‐thick PDMSB‐b‐PS films. |
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| Keywords: | double gyroid structure self‐assembly solvent‐vapor annealing templated substrates thin films |
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