| 热处理对BiO_x薄膜的组成和结构的影响 |
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| 引用本文： | 蒋志.热处理对BiO_x薄膜的组成和结构的影响[J].信息记录材料,2009,10(5):3-7. |
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| 作者姓名： | 蒋志 |
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| 作者单位： | 上海出版印刷高等专科学校,上海,200093;中国科学院,上海光学精密机械研究所,上海,201800 |
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| 摘 要： | 采用反应磁控溅射法在氧气和氩气比例为20∶100的混合气体中制备了非化学计量的氧化铋薄膜。薄膜分别在真空和空气中400℃退火30min。采用X射线光电子能谱(XPS)和X射线衍射(XRD)研究了薄膜在真空和空气中退火对其组成和结构的影响。分析表明,在真空退火条件下薄膜中的金属铋和次氧化铋发生了相变,金属铋晶粒长大;而在空气中退火时薄膜主要发生了金属铋和次氧化铋的氧化过程,得到了四方Bi2O3。
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| 关 键 词： | 氧化铋 薄膜 热处理 X射线光电子能谱 X射线衍射 |
Influence of Thermal Annealing on the Composition and Structure of BiO_x Thin Films |
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| JIANG Zhi.Influence of Thermal Annealing on the Composition and Structure of BiO_x Thin Films[J].Information Recording Materials,2009,10(5):3-7. |
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| Authors: | JIANG Zhi |
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| Affiliation: | JIANG Zhi1,2(1.Shanghai Publishing , Printing college,Shanghai 200093,China,2.Shanghai Institute of Optics , Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China) |
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| Abstract: | The nonstoichiometric bismuth oxide thin films were deposited by reactive DC-magnetron sputtering from a bismuth metallic target in a mixed Ar+O2 gas with the relative O2 content 20%. Then the as-deposited thin films were annealed at 400℃ for 30 minutes in vacuum and air,respectively. The effects of the two different heat treatments on the composition and structure of the thin films were studied by means of X-Ray Photoelectron Spectroscopy (XPS) and X-ray diffraction (XRD). The analysis reveals that the grain size of Bi embedded in the film increased and the phase transformation of Bi and BiO occurred during the heat treatment in vacuum. While for the annealing process in air,oxidation occurred in the composite thin films and tetragonal Bi2O3 was obtained. |
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| Keywords: | bismuth oxide thin film heat treatment XPS XRD |
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